Table 15.1: Calibration dependencies on Phase II parameter choices.
|
Parameter
|
Effect in pipeline calibration
|
| Engineering MODE |
Not calibrated; receive raw data files only. |
| Available-but-unsupported MODE |
Calibrated through flat-fielding only; no 2-D rectification, cosmic-ray rejection (if applicable), flux calibration, or 1-D extraction. |
MODE=ACQ or ACQ/PEAK |
Not calibrated; receive raw data files only. |
MODE=TIME-TAG |
Data events are tabulated in rootname_tag.fits file with one binary table extension for each buffer read (determined by exposure time and BUFFER-TIME parameters). All raw data events are gathered into a single image, rootname_raw.fits, which is then passed through the normal calibration steps. |
CCD only CR-SPLIT > 1 or Number_of_Iterations > 1 |
The number of imsets in the raw file equals CR-SPLIT or Number_of_Iterations. Raw file imsets are cosmic-ray rejected and summed before the bias, dark, and flat-fielding corrections are made, producing a rootname_crj.fits file. The individual imsets are also flagged for cosmic rays and processed without summing to produce a rootname_flt.fits file. |
MAMA only Number_of_Iterations > 1 |
The raw file contains Number_of_Iterations imsets, as do the flat-fielded and 2-D rectified files; the 1-D extracted files contain Number_of_Iterations tables. Repeat exposure imsets are summed after flat-fielding and 2-D rectification producing files rootname_sfl.fits and rootname_x2d.fits respectively (this is also true for imaging data). Note that for the MAMA detectors, 1-D spectral extraction data are not summed even when there are repeat exposures. |
POS-TARG |
Normal calibration processing. |
PATTERN |
Separate PATTERN step exposures are not associated with each other. Each PATTERN step exposure is processed through calibration independently. |
WAVECAL=NO |
No 1-D extraction or 2-D rectification of spectral data will be done, because the associated wavelengths would be incorrect and therefore misleading. |
Target_Name=CCDFLAT |
An internal STIS CCD flat-field lamp exposure useful in post-pipeline processing to correct for fringing above ~7000 Å with gratings G750L and G750M. |
